China High quality Zinc Sputtering Target Quotes, Factory, Manufacturers

Zinc Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Zinc Sputtering Target is produced by melting technology, normally used for depositing Znic oxide thin film, which can be luminescent film of LED and OLED products, or transparent conducting film of OLED products and anti-reflection film of thin-film solar cells. With up to 4N purity and special annealing treatment, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

 

Features

Chemical Composition: pure Zn

Available Purity: 4N

Production Technology: Melting

Shapes: planar targets, rotary target

Average Grain Size: < 100um

 

Certificate of analysis of 4N pure Zinc Sputtering Target

Zinc Sputtering Target 2.jpg 

 

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